One of the most promising approaches to enhancing the tribological properties of engineering coatings is to add transition elements to the structure. In this study, Nb-doped CrYN and V-doped CrYN thin films were deposited by pulsed DC reactive sputtering in a closed-field unbalanced magnetron sputtering (CFUBMS) system. The deposition parameters examined were target current (1, 1.5 and 2 A), deposition pressure (0.15, 0.25 and 0.35 Pa), pulse frequency (100, 200 and 350 kHz) and duty cycle (85 %, 70 % and 50 %). A Taguchi L9 orthogonal design was used to define the deposition process parameters for each doped film. The Nb and V-doped CrYN thin films were characterized in terms of their microstructure, thickness, composition, hardness and tribological properties by X-ray diffraction (XRD), scanning electron microscopy (SEM), Energy dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), nanohardness and pin-on-disc testing, respectively. The bond strength between the substrate and the films (adhesion) was analyzed by scratch testing. For the Nb-doped thin films, a maximum hardness value of 21.4 GPa and the lowest friction coefficient of 0.36 were obtained. On the other hand, in the V-doped thin films, the maximum hardness value was 16.1 GPa, while the lowest friction coefficient obtained was 0.11. In addition, Nb-doped and V-doped CrYN thin films exhibited extraordinary adhesion properties. The effect of the selected deposition parameters (target current, pulse frequency, and duty cycle) in relation to the film thickness, hardness, and coefficient of friction properties of the Nb and V-doped CrYN thin films were investigated using the Taguchi approach and optimum operating conditions were identified and confirmed.